This vacuum hot - press sintering furnace integrates atmosphere control, pressure forming, and high - temperature sintering, ideal for powder metallurgy and ceramic material research.
Used for precision coating of conductive, optical, and semiconductor films, this system supports research - grade thermal vacuum deposition in laboratory environments.
CMT - 450B laser coating system enables precise deposition of superconducting, semiconductor, and functional thin films. Ideal for research and prototyping.
Compact sputtering coater designed for nanoscale monolayer and multilayer thin films. Suitable for academic research and small - scale film fabrication.
High - energy laser coating system designed for fabricating superconducting, semiconductor, and ferroelectric thin films in R & D and pilot - scale production.
Designed for large - area thin film coatings, this four - chamber magnetron sputtering system enables sequential or reactive metal deposition on crystalline silicon under high or low vacuum.
CMT - 500e is designed for arc - melting high - melting - point metals and producing alloy ribbons using melt spinning or suction casting under vacuum conditions.
CMT-500p enables rapid melt spinning and spray casting under vacuum conditions, ideal for producing amorphous alloy ribbons and bulk materials in R & D environments.
CMT-500vt is a vacuum - based melt drawing system integrating induction melting, melt spinning, and spray casting for producing ultra - fine fibers and filaments.
Designed for rapid solidification, this vacuum melt spinning system enables the fabrication of amorphous alloys, nano - structured ribbons, and advanced magnetic materials.